Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ryota Sakane0
Date of Patent
November 9, 2021
0Patent Application Number
201802080
Date Filed
February 8, 2018
0Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Disclosed is a plasma processing apparatus including: a first electrode to which a high frequency power is supplied; a second electrode that functions as a counter electrode with respect to the first electrode; a plurality of dielectric units arranged between plasma generated between the first electrode and the second electrode, and the second electrode; and a controller that controls an impedance between the plasma and the second electrode via each of the dielectric units by independently controlling a position or a dielectric constant of each of the dielectric units.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
