Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ward Johnson0
Petri Raisanen0
Date of Patent
March 8, 2022
0Patent Application Number
164238240
Date Filed
May 28, 2019
0Patent Citations
...
Patent Primary Examiner
Patent abstract
An apparatus and method for reducing moisture within a wafer handling chamber is disclosed. The moisture reduction results in reduced oxidation of a wafer. The moisture reduction is made possible through use of valves and purging gas. Operation of the valves may result in improved localized purging.
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