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US Patent 11410883 Tungsten feature fill with nucleation inhibition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
March 6, 2019
Date of Patent
August 9, 2022
Patent Application Number
16294736
Patent Citations
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US Patent 10573522 Method for preventing line bending during metal fill process
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US Patent 10580654 Feature fill with multi-stage nucleation inhibition
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US Patent 10580695 Feature fill with nucleation inhibition
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US Patent 10916434 Feature fill with multi-stage nucleation inhibition
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US Patent 11075115 Tungsten feature fill
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US Patent 11355345 Method for preventing line bending during metal fill process
‌
US Patent 10193059 Perpendicularly magnetized spin-orbit magnetic device
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US Patent 10211099 Chamber conditioning for remote plasma process
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US Patent 10242879 Methods and apparatus for forming smooth and conformal cobalt film by atomic layer deposition
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US Patent 10256142 Tungsten feature fill with nucleation inhibition
•••
Patent Citations Received
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US Patent 11978666 Void free low stress fill
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11410883
Patent Primary Examiner
‌
Julio J Maldonado
CPC Code
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H01L 21/02071
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H01L 21/78
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H01L 21/02315
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H01L 21/0234
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H01L 21/76855
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H01L 21/02252
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H01L 21/043
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H01L 21/0485
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H01L 51/105
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H01L 28/56
•••

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