Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 6, 2022
Patent Application Number
16489756
Date Filed
April 2, 2018
Patent Primary Examiner
A dry etching gas composition is used which contains a saturated or unsaturated hydrofluorocarbon compound (excluding 1,2,2,3-pentafluorocyclobutane and 1,1,2,2-tetrafluorocyclobutane) represented by a general formula (1):
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