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US Patent 11437244 Dry etching gas composition and dry etching method
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Patent
Date Filed
April 2, 2018
Date of Patent
September 6, 2022
Patent Application Number
16489756
Patent Citations
US Patent 10217681 Gases for low damage selective silicon nitride etching
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11437244
Patent Primary Examiner
Lan Vinh
CPC Code
C09K 13/00
H01L 21/3065
H01L 21/31116
H01L 21/31138
H01L 21/32136
C09K 13/08
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