US Patent 11437244 Dry etching gas composition and dry etching method
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Edits on 27 Apr, 2023
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Patent Jurisdiction
Patent Number
114372440
Date of Patent
September 6, 2022
0Patent Application Number
164897560
Date Filed
April 2, 2018
0Patent Primary Examiner
Edits on 26 Sep, 2022
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Edits on 25 Sep, 2022
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Infobox
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Patent Jurisdiction
Patent Number
114372440
Date of Patent
September 6, 2022
0Patent Application Number
164897560
Date Filed
April 2, 2018
0Patent Primary Examiner
Edits on 7 Sep, 2022
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US Patent 11437244 Dry etching gas composition and dry etching method
Article
A dry etching gas composition is used which contains a saturated or unsaturated hydrofluorocarbon compound (excluding 1,2,2,3-pentafluorocyclobutane and 1,1,2,2-tetrafluorocyclobutane) represented by a general formula (1):
Infobox
Is a
Patent Jurisdiction
Patent Number
11437244
Date of Patent
September 6, 2022
Patent Application Number
16489756
Date Filed
April 2, 2018
Patent Primary Examiner
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