Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 10, 2023
Patent Application Number
17063177
Date Filed
October 5, 2020
Patent Citations
Patent Primary Examiner
CPC Code
The present disclosure describes a method for the formation of gate stacks having two or more titanium-aluminum (TiAl) layers with different Al concentrations (e.g., different Al/Ti ratios). For example, a gate structure can include a first TiAl layer with a first Al/Ti ratio and a second TiAl layer with a second Al/Ti ratio greater than the first Al/Ti ratio of the first TiAl layer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
