Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 24, 2023
Patent Application Number
17006167
Date Filed
August 28, 2020
Patent Citations
Patent Citations Received
Patent Primary Examiner
A semiconductor device with air spacers and air caps and a method of fabricating the same are disclosed. The semiconductor device includes a substrate and a fin structure disposed on the substrate. The fin structure includes a first fin portion and a second fin portion. The semiconductor device further includes a source/drain (S/D) region disposed on the first fin portion, a contact structure disposed on the S/D region, a gate structure disposed on the second fin portion, an air spacer disposed between a sidewall of the gate structure and the contact structure, a cap seal disposed on the gate structure, and an air cap disposed between a top surface of the gate structure and the cap seal.
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