Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 28, 2023
Patent Application Number
16774057
Date Filed
January 28, 2020
Patent Citations
Patent Citations Received
Patent Primary Examiner
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
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