US Patent 11592745 Positive resist composition and patterning process
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Patent Number
115927450
Date of Patent
February 28, 2023
0Patent Application Number
167740570
Date Filed
January 28, 2020
0Patent Citations
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US Patent 11592745 Positive resist composition and patterning process
Article
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
Infobox
Is a
Patent Jurisdiction
Patent Number
115927450
Date of Patent
February 28, 2023
0Patent Application Number
167740570
Date Filed
January 28, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
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