Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 25, 2023
0Patent Application Number
170811060
Date Filed
October 27, 2020
0Patent Citations
Patent Primary Examiner
A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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