Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masaki Ohashi0
Jun Hatakeyama0
Date of Patent
October 16, 2018
0Patent Application Number
156667310
Date Filed
August 2, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodinated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
