US Patent 10101653 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodinated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
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Patent Number
101016530
Date of Patent
October 16, 2018
0Patent Application Number
156667310
Date Filed
August 2, 2017
0Patent Citations Received
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US Patent 10101653 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
10101653
Date of patent
October 16, 2018
Patent application number
15666731
Date Filed
August 2, 2017
Patent primary examiner
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