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US Patent 10101653 Resist composition and patterning process
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Patent
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Date Filed
August 2, 2017
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Date of Patent
October 16, 2018
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Patent Application Number
15666731
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Patent Citations Received
US Patent 11656549 Resist composition and method of forming resist pattern
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US Patent 11262653 Sulfonium salt, polymer, resist composition, and patterning process
US Patent 11754922 Resist composition and method of forming resist pattern
US Patent 11703758 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device
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US Patent 11635685 Resist composition and patterning process
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Patent Inventor Names
Masaki Ohashi
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Jun Hatakeyama
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10101653
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Patent Primary Examiner
John S. Chu
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