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US Patent 11675276 Metrology apparatus and photonic crystal fiber

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
August 14, 2019
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Date of Patent
June 13, 2023
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Patent Application Number
16540145
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Patent Citations
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US Patent 10571244 Measuring surface roughness
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US Patent 10895452 Metrology apparatus
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US Patent 9645093 System and method for apodization in a semiconductor device inspection system
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US Patent 9739702 Symmetric target design in scatterometry overlay metrology
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US Patent 9897645 Illuminator for wafer prober and related methods
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US Patent 10211592 Fiber laser with free-space components
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US Patent 8823922 Overlay measurement apparatus, lithographic apparatus and device manufacturing method using such overlay measurement apparatus
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US Patent 9081302 Inspection apparatus and method, lithographic apparatus and lithographic processing cell
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US Patent 9176072 Dark field inspection system with ring illumination
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US Patent 7471435 Apodization technique for enhanced resolution of images
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11675276
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Patent Primary Examiner
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Gordon J Stock, Jr.
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CPC Code
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G03F 7/70616
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G03F 7/70625
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G03F 7/70633
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G03F 7/70641
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G03F 7/7065
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G03F 7/2008
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G03F 7/70008
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G03F 7/70158
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G03F 7/70191
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G03F 7/70241
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