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US Patent 11703756 Resist composition and method of forming resist pattern
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Edits on 19 Jul, 2023
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Golden AI
created this topic on 19 Jul, 2023
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US Patent 11703756 Resist composition and method of forming resist pattern
Infobox
Is a
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11703756
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Date of Patent
July 18, 2023
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Patent Application Number
16420947
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Date Filed
May 23, 2019
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Patent Citations
US Patent 7301047 Salt suitable for an acid generator and a chemically amplified resist composition containing the same
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US Patent 8450041 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
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US Patent 8900791 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition
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US Patent 9023584 Radiation-sensitive composition, and compound
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US Patent 9052592 Resist composition and resist pattern forming method
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US Patent 9122154 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
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US Patent 9128370 Radiation-sensitive composition and compound
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US Patent 9354515 Resist composition, acid generator, polymeric compound and method of forming resist pattern
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US Patent 11221557 Resist composition, method of forming resist pattern, compound, and acid generator
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US Patent 9766541 Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
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US Patent 10221131 Acid generator compounds and photoresists comprising same
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US Patent 10649330 Resist composition, method of forming resist pattern, compound, and acid generator
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US Patent 11256169 Resist composition, and method of forming resist pattern
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Patent Primary Examiner
John S. Chu
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CPC Code
G03F 7/38
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G03F 7/30
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G03F 7/2059
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G03F 7/0392
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G03F 7/0397
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G03F 7/0045
0
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