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US Patent 11715783 Uniform horizontal spacer

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
December 29, 2020
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Date of Patent
August 1, 2023
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Patent Application Number
17136735
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Patent Citations
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US Patent 9627511 Vertical transistor having uniform bottom spacers
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US Patent 9741626 Vertical transistor with uniform bottom spacer formed by selective oxidation
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US Patent 9748359 Vertical transistor bottom spacer formation
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US Patent 9773901 Bottom spacer formation for vertical transistor
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US Patent 9859388 Uniform vertical field effect transistor spacers
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US Patent 9799749 Vertical transport FET devices with uniform bottom spacer
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US Patent 9870957 Vertical fin field effect transistor (V-FinFET), semiconductor device having V-FinFET and method of fabricating V-FinFET
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US Patent 9502519 Semiconductor device and method for fabricating the same
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US Patent 9601491 Vertical field effect transistors having epitaxial fin channel with spacers below gate structure
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11715783
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Patent Primary Examiner
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Joseph C. Nicely
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