Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sheng-Kang Yu
Shang-Chieh Chien
Li-Jui Chen
Heng-Hsin Liu
Che-Chang Hsu
Date of Patent
September 5, 2023
Patent Application Number
17462695
Date Filed
August 31, 2021
Patent Citations
...
Patent Primary Examiner
In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.
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