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US Patent 11762277 EUV photomask

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

June 25, 2021

Date of Patent

September 19, 2023

Patent Application Number

17358785

Patent Citations

US Patent 9869928 Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

US Patent 9465286 Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

US Patent 9535332 Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask

US Patent 7376512 Method for determining an optimal absorber stack geometry of a lithographic reflection mask

US Patent 7642017 Reflective photomask, method of fabricating the same, and reflective blank photomask

US Patent 7960076 Reflective-type mask

US Patent 8691476 EUV mask and method for forming the same

Patent Inventor Names

Moosong Lee

Seongbo Shim

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Christopher G Young

CPC Code

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