US Patent 11762305 Alignment method
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US Patent 11762305 Alignment method
Article
Patent abstract
Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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Patent Number
Patent Inventor Names
Filippo Alpeggiani
Sebastianus Adrianus Goorden
Sergei Sokolov
Simon Reinald Huisman
Date of Patent
September 19, 2023
Patent Application Number
17782570
Date Filed
November 16, 2020
Patent Citations
Patent Primary Examiner
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