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US Patent 11763057 Critical dimension uniformity

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 25, 2021
Date of Patent
September 19, 2023
Patent Application Number
17358407
Patent Citations
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US Patent 10628546 Method and system for automatically extracting layout design patterns for custom layout design reuse through interactive recommendations
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US Patent 10083269 Computer implemented system and method for generating a layout of a cell defining a circuit component
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US Patent 10402530 Method, system, and computer program product for implementing placement using row templates for an electronic design
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US Patent 7319506 Alignment system and method
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US Patent 7465525 Reticle alignment and overlay for multiple reticle process
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US Patent 8796666 MOS devices with strain buffer layer and methods of forming the same
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US Patent 8850366 Method for making a mask by forming a phase bar in an integrated circuit design layout
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US Patent 8906595 Method for improving resist pattern peeling
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US Patent 8954899 Contour alignment system
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US Patent 9093530 Fin structure of FinFET
•••
Patent Inventor Names
Chi-Ta Lu
Chi-Ming Tsai
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11763057
Patent Primary Examiner
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Suresh Memula
CPC Code
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G06F 2111/06
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G06F 30/39

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