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US Patent 8906595 Method for improving resist pattern peeling

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Chia-Chu Liu0

Chie-Chieh Lin0

Chung-Ming Wang0

Kuei-Shun Chen0

Yu-Lun Liu0

Date of Patent

December 9, 2014

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Patent Application Number

136661070

Date Filed

November 1, 2012

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Patent Citations Received

US Patent 12073166 Method and structure for mandrel patterning

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US Patent 11682647 Semiconductor package and method for manufacturing the same

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US Patent 11747786 Synchronized parallel tile computation for large area lithography simulation

US Patent 11748551 Optical mode optimization for wafer inspection

US Patent 11763057 Critical dimension uniformity

US Patent 11789370 Optical proximity correction and photomasks

US Patent 11914288 Photomask having recessed region

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Patent Primary Examiner

Caleen Sullivan

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