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US Patent 8906595 Method for improving resist pattern peeling

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
November 1, 2012
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Date of Patent
December 9, 2014
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Patent Application Number
13666107
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Patent Citations Received
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US Patent 12073166 Method and structure for mandrel patterning
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US Patent 11682647 Semiconductor package and method for manufacturing the same
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US Patent 11747786 Synchronized parallel tile computation for large area lithography simulation
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US Patent 11748551 Optical mode optimization for wafer inspection
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US Patent 11763057 Critical dimension uniformity
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US Patent 11789370 Optical proximity correction and photomasks
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US Patent 11914288 Photomask having recessed region
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Patent Inventor Names
Chia-Chu Liu
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Chie-Chieh Lin
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Chung-Ming Wang
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Kuei-Shun Chen
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Yu-Lun Liu
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
8906595
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Patent Primary Examiner
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Caleen Sullivan
0

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