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US Patent 8906595 Method for improving resist pattern peeling

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US Patent 12073166 Method and structure for mandrel patterning
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US Patent 11914288 Photomask having recessed region
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US Patent 11789370 Optical proximity correction and photomasks
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Patent Inventor Names
Chia-Chu Liu0
Chie-Chieh Lin0
Chung-Ming Wang0
Kuei-Shun Chen0
Yu-Lun Liu0
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US Patent 11763057 Critical dimension uniformity
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US Patent 11747786 Synchronized parallel tile computation for large area lithography simulation
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US Patent 11748551 Optical mode optimization for wafer inspection
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US Patent 11682647 Semiconductor package and method for manufacturing the same
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US Patent 08906595 Method for improving resist pattern peeling US Patent 8906595 Method for improving resist pattern peeling

Infobox
Patent Number
089065950
Patent Number
89065950
Edits on 22 May, 2023
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edited on 22 May, 2023
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=089065950
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
089065950
Date of Patent
December 9, 2014
0
Patent Application Number
136661070
Date Filed
November 1, 2012
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=089065950
Patent Primary Examiner
‌
Caleen Sullivan
0
Edits on 15 Jun, 2022
"Entity importer update"
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edited on 15 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=08906595
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created this topic on 28 Dec, 2021
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 US Patent 08906595 Method for improving resist pattern peeling

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08906595
Date of patent
December 9, 2014
Patent application number
13666107
Date Filed
November 1, 2012
Patent primary examiner
‌
Caleen Sullivan

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