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US Patent 11764081 Wafer cleaning apparatus and method
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Patent
Date Filed
June 17, 2021
Date of Patent
September 19, 2023
Patent Application Number
17350036
Patent Citations
US Patent 8475668 Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored therein
US Patent 10553421 Substrate processing apparatus, substrate processing method and storage medium
Patent Inventor Names
Bi-Ming Yen
Pei Yen Hsia
Ping-Jung Huang
Hung-Lung Hu
Jieh-Chau Huang
Ying Ting Hsia
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11764081
Patent Primary Examiner
Sharidan Carrillo
CPC Code
H01L 21/6875
H01L 21/68728
H01L 21/67393
H01L 21/67288
H01L 21/67253
H01L 21/67248
H01L 21/6719
H01L 21/67051
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