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US Patent 11776857 Semiconductor device

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
January 3, 2022
Date of Patent
October 3, 2023
Patent Application Number
17567403
Patent Citations
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US Patent 11239120 Semiconductor device
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US Patent 9704737 Semiconductor device and method for fabricating the same
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US Patent 9728643 Semiconductor devices having a spacer on an isolation region
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US Patent 7535061 Fin-field effect transistors (Fin-FETs) having protection layers
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US Patent 7902035 Semiconductor device having multiple fin heights
‌
US Patent 8748989 Fin field effect transistors
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US Patent 8963279 Semiconductor device isolation structures
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US Patent 9159832 Semiconductor fin structures and methods for forming the same
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US Patent 9337260 Shallow trench isolation in bulk substrate
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US Patent 9343370 Method for fabricating semiconductor device
•••
Patent Inventor Names
Donghyun Roh
Sunki Min
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11776857
Patent Primary Examiner
‌
Erik Kielin
CPC Code
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H01L 27/0924
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H01L 21/823821
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H01L 27/0886

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