US Patent 11883925 Polishing pad and method for manufacturing same
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US Patent 11883925 Polishing pad and method for manufacturing same
Article
Patent abstract
A polishing pad is equipped with a polishing layer having a polyurethane sheet, wherein a tan δ peak value change rate determined by formula: tan δ peak value change rate=|tan δ peak
Infobox
Is a
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hiroshi Kurihara0
Ryuma Matsuoka0
Satsuki Narushima0
Yamato Takamizawa0
Date of Patent
January 30, 2024
0Patent Application Number
170406380
Date Filed
March 19, 2019
0Patent Citations
Patent Primary Examiner
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