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US Patent 11923220 Substrate processing apparatus

Patent 11923220 was granted and assigned to Tokyo Electron on March, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Tokyo Electron
Tokyo Electron
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Date Filed
January 16, 2019
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Date of Patent
March 5, 2024
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Patent Applicant
Tokyo Electron
Tokyo Electron
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Patent Application Number
16964247
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Patent Citations
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US Patent 8326468 Substrate transfer apparatus, substrate transfer module, substrate transfer method and computer readable storage medium
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US Patent 8591224 Substrate processing apparatus and substrate processing method
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US Patent 8654325 Substrate processing apparatus, substrate processing method, and computer-readable storage medium having program for executing the substrate processing method stored therein
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US Patent 8817225 Coating and developing apparatus and method, and storage medium
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US Patent 8858754 Plasma processing apparatus
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US Patent 8888387 Coating and developing apparatus and method
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US Patent 8985880 Coating and developing apparatus and method
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US Patent 9224283 Substrate processing apparatus, alarm management method of substrate processing apparatus, and storage medium
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US Patent 9417529 Coating and developing apparatus and method
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US Patent 9460947 Coating and developing apparatus and method, and storage medium
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•••
Patent Inventor Names
Naoyuki Okamura
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Hirotaka Maruyama
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11923220
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Patent Primary Examiner
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Jethro M. Pence
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