US Patent 11923220 Substrate processing apparatus
Patent 11923220 was granted and assigned to Tokyo Electron on March, 2024 by the United States Patent and Trademark Office.
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US Patent 11923220 Substrate processing apparatus
Article
Patent abstract
A substrate processing apparatus includes: a processing chamber; a substrate holder that is disposed in the processing chamber and holds a substrate; a processing liquid supply that supplies a processing liquid to the substrate held in the substrate holder; an infrared camera that acquires an infrared image of the processing chamber; and a controller that detects at least a state of the processing liquid based on the infrared image and monitors presence/absence of an abnormality.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hirotaka Maruyama0
Naoyuki Okamura0
Date of Patent
March 5, 2024
0Patent Application Number
169642470
Date Filed
January 16, 2019
0Patent Citations
0
Patent Primary Examiner
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