Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chien Ning Yao0
Jung-Hung Chang0
Zhi-Chang Lin0
Kuan-Ting Pan0
Kuo-Cheng Chiang0
Shih-Cheng Chen0
Lo-Heng Chang0
Date of Patent
March 12, 2024
0Patent Application Number
172383760
Date Filed
April 23, 2021
0Patent Citations
0
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Patent Primary Examiner
Patent abstract
The present disclosure describes a semiconductor structure with a dielectric liner. The semiconductor structure includes a substrate and a fin structure on the substrate. The fin structure includes a stacked fin structure, a fin bottom portion below the stacked fin structure, and an isolation layer between the stacked fin structure and the bottom fin portion. The semiconductor structure further includes a dielectric liner in contact with an end of the stacked fin structure and a spacer structure in contact with the dielectric liner.
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