US Patent 11955333 Methods and apparatus for processing a substrate
Patent 11955333 was granted and assigned to Applied Materials on April, 2024 by the United States Patent and Trademark Office.
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US Patent 11955333 Methods and apparatus for processing a substrate
Article
Patent abstract
Methods and apparatus for processing a substrate are provided herein. For example, a method includes supplying a vaporized precursor into a processing volume, supplying activated elements including ions and radicals from a remote plasma source, energizing the activated elements using RF source power at a first duty cycle to react with the vaporized precursor to deposit an SiNH
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bhargav Sridhar Citla0
Douglas Arthur Buchberger, Jr.0
Ellie Yieh0
Erica Chen0
Jethro Tannos0
Joshua Alan Rubnitz0
Nikolaos Bekiaris0
Soham Sunjay Asrani0
Srinivas D. Nemani0
Date of Patent
April 9, 2024
0Patent Application Number
172087190
Date Filed
March 22, 2021
0Patent Citations
Patent Primary Examiner
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