Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nan Wang0
Date of Patent
April 9, 2024
0Patent Application Number
172340610
Date Filed
April 19, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
A semiconductor device and a fabrication method are provided. The semiconductor device includes: a base substrate; a gate structure on the base substrate including a first portion in a first region and a second portion in a second region; and a separation section in the first portion of the gate structure in the first region. A length of the first portion of the gate structure in the first region is larger than a length of the second portion of the gate structure in the second region. A top surface of the separation section is higher than a top surface of the gate structure.
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