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US Patent 11984402 Semiconductor device and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
July 21, 2022
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Date of Patent
May 14, 2024
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Patent Application Number
17870531
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Patent Citations
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US Patent 9502265 Vertical gate all around (VGAA) transistors and methods of forming the same
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US Patent 9520482 Method of cutting metal gate
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US Patent 9536738 Vertical gate all around (VGAA) devices and methods of manufacturing the same
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US Patent 9576814 Method of spacer patterning to form a target integrated circuit pattern
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US Patent 9608116 FINFETs with wrap-around silicide and method forming the same
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US Patent 10269621 Contact plugs and methods forming same
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US Patent 10734412 Backside contact resistance reduction for semiconductor devices with metallization on both sides
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US Patent 11024550 Semiconductor device and method
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US Patent 11205597 Semiconductor device and method
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US Patent 11410930 Semiconductor device and method
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•••
Patent Inventor Names
Pei-Yu Wang
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Yu-Xuan Huang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11984402
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Patent Primary Examiner
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Tong-Ho Kim
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CPC Code
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H01L 21/823821
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H01L 21/823871
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B82Y 10/00
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H01L 27/0924
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H01L 23/5286
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H01L 21/02603
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H01L 21/28518
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H01L 21/31116
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H01L 21/31144
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H01L 29/0673
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•••

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