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US Patent 11988953 EUV masks to prevent carbon contamination

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
January 6, 2023
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Date of Patent
May 21, 2024
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Patent Application Number
18151416
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Patent Citations
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US Patent 8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same
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US Patent 8841047 Extreme ultraviolet lithography process and mask
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US Patent 8877409 Reflective mask and method of making same
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US Patent 8927179 Optical member for EUV lithography, and process for production of reflective layer-equipped substrate
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US Patent 9093530 Fin structure of FinFET
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US Patent 9184054 Method for integrated circuit patterning
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US Patent 9256123 Method of making an extreme ultraviolet pellicle
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US Patent 9529268 Systems and methods for improving pattern transfer
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US Patent 10877368 Extreme ultraviolet mask blank with alloy absorber and method of manufacture
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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•••
Patent Inventor Names
Pei-Cheng Hsu
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Ta-Cheng Lien
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Hsin-Chang Lee
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11988953
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Patent Primary Examiner
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Christopher G Young
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CPC Code
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G03F 1/24
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G03F 1/22
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