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US Patent 8841047 Extreme ultraviolet lithography process and mask

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8841047

Patent Inventor Names

Shinn-Sheng Yu0

Yen-Cheng Lu0

Anthony Yen0

Date of Patent

September 23, 2014

Patent Application Number

13437099

Date Filed

April 2, 2012

Patent Citations Received

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US Patent 12130548 Extreme ultraviolet mask with reduced wafer neighboring effect

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US Patent 12072633 Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof

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US Patent 12087578 Semiconductor structure and method of forming the same

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US Patent 12130556 Plasma position control for extreme ultraviolet lithography light sources

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US Patent 11656553 Method for forming semiconductor structure

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Patent Primary Examiner

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Stewart Fraser

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