Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yee-Chia Yeo0
Liang-Yin Chen0
Chun-Hung Wu0
Chia-Cheng Chen0
Huicheng Chang0
Date of Patent
September 10, 2024
0Patent Application Number
176518510
Date Filed
February 21, 2022
0Patent Citations
...
Patent Primary Examiner
CPC Code
Patent abstract
A method of forming a semiconductor device includes forming a photoresist over a target layer, where the target layer includes a substrate. The photoresist is patterned to form a patterned photoresist. Scum remains between portions of the patterned photoresist. The substrate is tilted relative to a direction of propagation of an ion beam. An ion treatment is performed on the scum. A pattern of the patterned photoresist is transferred to the target layer.
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