Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yuan-Ku Lan0
Date of Patent
May 21, 2024
0Patent Application Number
173864870
Date Filed
July 27, 2021
0Patent Citations
Patent Primary Examiner
CPC Code
Patent abstract
A method for detecting a defect in a semiconductor fabrication process is disclosed. The method includes forming photoresist on a substrate; forming a fluorescent agent in the photoresist; and detecting the defect of the photoresist after being subjected to developing by utilizing the fluorescent agent.
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