Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 20, 2018
Patent Application Number
15252952
Date Filed
August 31, 2016
Patent Citations Received
Patent Primary Examiner
Patent abstract
Example embodiments of inventive concepts provide a method for inspecting and/or observing photoresist patterns. The inspecting and/or observing methods may include forming at least an anti-reflective layer on a substrate, forming a fluorescent photoresist pattern on the anti-reflective layer, the fluorescent photoresist pattern having fluorescence, and observing and/or inspecting a shape of the fluorescent photoresist pattern using a fluorescence microscope.
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