US Patent 9921487 Method for inspecting photoresist pattern
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Patent abstract
Example embodiments of inventive concepts provide a method for inspecting and/or observing photoresist patterns. The inspecting and/or observing methods may include forming at least an anti-reflective layer on a substrate, forming a fluorescent photoresist pattern on the anti-reflective layer, the fluorescent photoresist pattern having fluorescence, and observing and/or inspecting a shape of the fluorescent photoresist pattern using a fluorescence microscope.
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US Patent 09921487 Method for inspecting photoresist pattern US Patent 9921487 Method for inspecting photoresist pattern
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Patent Number
0992148700
Patent Number
992148700
Edits on 6 Apr, 2023
Golden AI
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Is a
Patent Jurisdiction
Patent Number
099214870
Date of Patent
March 20, 2018
0Patent Application Number
152529520
Date Filed
August 31, 2016
0Patent Primary Examiner
Edits on 5 Oct, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
099214870
Date of Patent
March 20, 2018
0Patent Application Number
152529520
Date Filed
August 31, 2016
0Patent Primary Examiner
Edits on 19 Jan, 2022
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US Patent 09921487 Method for inspecting photoresist pattern
Infobox
Is a
Patent jurisdiction
Patent number
09921487
Date of patent
March 20, 2018
Patent application number
15252952
Date Filed
August 31, 2016
Patent primary examiner
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