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US Patent 11994798 Resist material and patterning process

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Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

119947980

Patent Inventor Names

Seiichiro Tachibana0

Tomohiro Kobayashi0

Hiroki Nonaka0

Tsukasa Watanabe0

Date of Patent

May 28, 2024

Patent Application Number

169377160

Date Filed

July 24, 2020

Patent Citations

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US Patent 7537880 Polymer, resist composition, and patterning process

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US Patent 9310684 Organometallic solution based high resolution patterning compositions

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