Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Koji Hasegawa0
Wataru Kusaki0
Jun Hatakeyama0
Yuji Harada0
Takao Yoshihara0
Tomohiro Kobayashi0
Date of Patent
May 26, 2009
Patent Application Number
11905763
Date Filed
October 3, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
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