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US Patent 11994798 Resist material and patterning process
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Edits on 29 May, 2024
"Created via: Patent importer"
Golden AI
created this topic on 29 May, 2024
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US Patent 11994798 Resist material and patterning process
Infobox
Is a
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11994798
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Patent Inventor Names
Hiroki Nonaka
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Seiichiro Tachibana
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Tomohiro Kobayashi
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Tsukasa Watanabe
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Date of Patent
May 28, 2024
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Patent Application Number
16937716
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Date Filed
July 24, 2020
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Patent Citations
US Patent 7537880 Polymer, resist composition, and patterning process
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US Patent 9310684 Organometallic solution based high resolution patterning compositions
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Patent Primary Examiner
Mark F. Huff
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CPC Code
G03F 7/26
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G03F 7/32
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G03F 7/325
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G03F 7/2037
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G03F 7/2004
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G03F 7/168
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G03F 7/0048
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G03F 7/0045
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G03F 7/0042
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