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US Patent 11996432 Image sensor device and manufacturing method thereof

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
July 25, 2022
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Date of Patent
May 28, 2024
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Patent Application Number
17871985
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Patent Citations
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US Patent 9093530 Fin structure of FinFET
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US Patent 9028915 Method of forming a photoresist layer
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US Patent 9146469 Middle layer composition for trilayer patterning stack
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US Patent 9213234 Photosensitive material and method of lithography
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US Patent 9223220 Photo resist baking in lithography process
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US Patent 9256133 Apparatus and method for developing process
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US Patent 9536759 Baking apparatus and method
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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US Patent 10121811 Method of high-aspect ratio pattern formation with submicron pixel pitch
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US Patent 10186542 Patterning for substrate fabrication
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•••
Patent Inventor Names
Wei-Chao Chiu
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Ching-Sen Kuo
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Chun-Wei Chang
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Feng-Jia Shiu
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11996432
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Patent Primary Examiner
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David A Zarneke
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CPC Code
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H01L 27/14806
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H01L 27/14683
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H01L 27/1463
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