Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsiao-Lun Chang0
Li-Jui Chen0
Po-Chung Cheng0
Shih-Yu Tu0
Han-Lung Chang0
Date of Patent
May 28, 2024
0Patent Application Number
180641560
Date Filed
December 9, 2022
0Patent Citations
...
Patent Primary Examiner
CPC Code
Patent abstract
A method includes following steps. A photoresist-coated substrate is received to an extreme ultraviolet (EUV) tool. An EUV radiation is directed from a radiation source onto the photoresist-coated substrate, wherein the EUV radiation is generated by an excitation laser hitting a plurality of target droplets ejected from a first droplet generator. The first droplet generator is replaced with a second droplet generator at a temperature not lower than about 150° C.
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