US Patent 12013632 Pellicle having vent hole
Patent 12013632 was granted and assigned to Taiwan Semiconductor Manufacturing Company on June, 2024 by the United States Patent and Trademark Office.
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Edits on 19 Jun, 2024
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US Patent 12013632 Pellicle having vent hole
Article
Patent abstract
A pellicle includes a frame configured to attach to a photomask, wherein the frame includes a vent hole. The pellicle further includes a filter covering the vent hole, wherein the filter directly connects to an outer surface of the frame. The pellicle further includes a membrane extending over a top surface of the frame. The pellicle further includes a mount between the frame and the membrane, wherein the mount is attachable to the frame by an adhesive.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chien-Cheng Chen0
Chih-Chiang Tu0
Chue San Yoo0
Hsin-Chang Lee0
Jong-Yuh Chang0
Kun-Lung Hsieh0
Pei-Cheng Hsu0
Yun-Yue Lin0
Date of Patent
June 18, 2024
0Patent Application Number
174973370
Date Filed
October 8, 2021
0Patent Citations
Patent Primary Examiner
CPC Code
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