Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tatsuya E. Sato0
Lakmal C. Kalutarage0
Mark Saly0
Jeffrey W. Anthis0
Date of Patent
June 25, 2024
0Patent Application Number
165772200
Date Filed
September 20, 2019
0Patent Citations
Patent Primary Examiner
Patent abstract
Methods for depositing film comprise depositing an aluminum-containing gap-fill film in a bottom-up manner in a feature of a substrate surface. The substrate can be sequentially exposed to an aluminum-containing precursor, a reactant, a fluorinating agent, and an etchant any number of times to promote bottom-up growth of the film in the feature.
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