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US Patent 12025923 Lithography system and operation method thereof

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
January 6, 2023
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Date of Patent
July 2, 2024
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Patent Application Number
18151163
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Patent Citations
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US Patent 11550233 Lithography system and operation method thereof
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US Patent 9529268 Systems and methods for improving pattern transfer
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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US Patent 8764995 Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
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US Patent 8796666 MOS devices with strain buffer layer and methods of forming the same
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US Patent 8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same
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US Patent 8841047 Extreme ultraviolet lithography process and mask
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US Patent 8877409 Reflective mask and method of making same
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US Patent 9093530 Fin structure of FinFET
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US Patent 9184054 Method for integrated circuit patterning
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•••
Patent Inventor Names
Min-Cheng Wu
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Chi-Hung Liao
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12025923
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Patent Primary Examiner
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Steven Whitesell Gordon
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CPC Code
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H05G 2/006
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G03F 7/70033
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