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US Patent 12104249 Sequential infiltration synthesis of group 13 oxide electronic materials

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Ruben Waldman0

Seth B. Darling0

Alex B. Martinson0

Date of Patent

October 1, 2024

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Patent Application Number

165157180

Date Filed

July 18, 2019

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Patent Citations

US Patent 8900467 Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis

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US Patent 8986562 Methods of laser processing photoresist in a gaseous environment

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US Patent 9487600 Ordered nanoscale domains by infiltration of block copolymers

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US Patent 9416447 Method for line density multiplication using block copolymers and sequential infiltration synthesis

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US Patent 9684234 Sequential infiltration synthesis for enhancing multiple-patterning lithography

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US Patent 7163641 Method of forming high aspect ratio apertures

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US Patent 7399709 Complementary replacement of material

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Patent Primary Examiner

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CPC Code

0

Patent abstract

The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In

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