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US Patent 12104249 Sequential infiltration synthesis of group 13 oxide electronic materials
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US Patent 12104249 Sequential infiltration synthesis of group 13 oxide electronic materials
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Patent abstract
The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In
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Is a
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
12104249
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Patent Inventor Names
Alex B. Martinson
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Ruben Waldman
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Seth B. Darling
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Date of Patent
October 1, 2024
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Patent Application Number
16515718
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Date Filed
July 18, 2019
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Patent Citations
US Patent 7163641 Method of forming high aspect ratio apertures
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US Patent 7399709 Complementary replacement of material
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US Patent 8900467 Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
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US Patent 8986562 Methods of laser processing photoresist in a gaseous environment
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US Patent 9416447 Method for line density multiplication using block copolymers and sequential infiltration synthesis
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US Patent 9487600 Ordered nanoscale domains by infiltration of block copolymers
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US Patent 9684234 Sequential infiltration synthesis for enhancing multiple-patterning lithography
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Patent Primary Examiner
David P Turocy
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CPC Code
C23C 16/407
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