Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeffrey W. Elam0
Yu-Chih Tseng0
Seth B. Darling0
Date of Patent
June 20, 2017
0Patent Application Number
139021690
Date Filed
May 24, 2013
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.
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